Automated Process Monitoring

Real-time monitoring of semiconductor process chemicals and ultrapure water (UPW) is vital to provide the information needed to improve manufacturing processes and maximize product yield. Metal impurities are monitored in process chemicals at delivery (by tanker or drums), at the central chemical supply, at distribution points, and at the point of use. Chemical monitoring is required 24/7 to verify low or even sub-ppt levels of metal contamination.

Real-time ultra-trace metal monitoring system

Remote Modules

  • Remote sampling (up to 300m, standard configuration)
  • Remote sampling with dilution (up to 300m, standard configuration)
  • Small volume sample transfer (1-3mL)
  • Dedicated transfer line for each chemical

Central System

  • Autocalibration
  • Fully automated system (24/7 in-FAB monitoring)
  • QC functions (over range, recalibration)
  • Multiple chemicals or streams monitored


  • Smart software interface
  • SECS/GEM communication capability
  • Set contamination limit
  • Send Alerts

Benefits of Real-time Monitoring

As organizations look to improve productivity and use real-time data to better understand and improve processes, the scoutDX/ICP-MS system offers several benefits:

  • Immediate detection and notification of metal contamination to:
    - minimize product loss due to accidental contamination
    - allow investigation and elimination of sources of contamination
    - optimize chemical lifetime and reduce cost of disposal and replacement
  • Improved product yield
  • Reduced human contact with hazardous chemical samples, improving safety and reducing manual handling errors
  • Customizable software to enable flexible, user-defined parameters for contamination control at every sampling station